掃描式電子顯微鏡虛擬實作 (Secondary Electron Microscopy (SEM) Virtual Lab))

AEML, NTUST - SEM Virtual Lab - Advanced Engineering Materials Laboratory, National Taiwan University of Science and Technology

SEM Virtual Lab: Scanning Electron Microscope Simulator掃描式電子顯微鏡虛擬實驗室

Instrument Control Panel儀器操作面板

Specimen試樣

Conductive coating導電鍍膜

Stage position X / Y載台位置 X / Y

Geometry & Aperture幾何配置與光圈

Specimen tilt (°)試樣傾斜度 (°) default內定值 °

Working distance WD (mm)工作距離 WD (mm) default內定值 mm

Detector angle (°)偵測器角度 (°) default內定值 ° (elevation / EDS take-off)(仰角／EDS 取出角)

Objective aperture (µm)物鏡光圈 (µm) 1020305070100 default內定值 µm

Electron Gun電子槍

Electron source電子源

Filament current (A)燈絲電流 (A) default內定值 A

Beam energy E₀ (keV)電子束能量 (keV) default內定值 keV

Spot size (condenser)電子束點大小 (聚光鏡) default內定值

Detector & Scan偵測器與掃描

Imaging signal影像訊號

Secondary electron (SE)二次電子 Backscattered electron (BSE)背散射電子

Scan speed (dwell time)掃描速度 (停留時間)

EDS (Energy Dispersive Spectroscopy)EDS 能量散佈光譜

Enable EDS detector開啟 EDS 偵測

Dot (point) mode點模式 Selected area mode選擇區域模式 Whole area mode全區模式

Live time (s)量測時間 (s) default內定值 s

Mouse: move stage滑鼠：移動試樣 Mouse: pick EDS point / area滑鼠：選取 EDS 點／區域

Live Beam & Interaction Readouts即時電子束與作用體積參數

Filament emission (saturation)燈絲發射 (飽和度)
Estimated filament life預估燈絲壽命
Probe current探針電流 Ip
Probe diameter電子束探針直徑 dp
Convergence semi-angle收斂半角 α
Depth of field景深
Field of view (width)視野寬度
Pixel size像素尺寸
Defocus Δf失焦量 Δf
Electron range (Kanaya–Okayama)電子穿透範圍 (Kanaya–Okayama)
X-ray generation range (Anderson–Hasler, Ec=1 keV)X 光產生範圍 (Anderson–Hasler)

Operation Console: Magnification, Focus & Stigmation操作台：放大倍率、焦距與散光調整

Magnification放大倍率

Focus: coarse (mm)焦距粗調 (mm)

Focus: fine (µm)焦距細調 (µm)

Stigmator XX 方向散光

Stigmator YY 方向散光

Image Adjustment影像調整

Brightness亮度

Contrast對比

Gamma伽瑪 (灰階曲線)

Invert (negative)負片反轉

Defaults: brightness 50, contrast 50, gamma 1.00. Tip: hover over the image and use Shift + mouse wheel for brightness, Ctrl + mouse wheel for contrast.內定值：亮度 50、對比 50、伽瑪 1.00。提示：滑鼠移到影像上，Shift + 滾輪調整亮度，Ctrl + 滾輪調整對比。

Filament is not heated: no electron beam.燈絲未加熱：沒有電子束。

Filament under-saturated: emission is low, so the image is dark and noisy. Raise the filament current to the saturation point.燈絲未達飽和：發射電流不足，影像偏暗且雜訊多，請將燈絲電流提高至飽和點。

Filament current is beyond saturation: no gain in brightness, but the filament life is shortened.燈絲電流超過飽和點：亮度不再提升，但燈絲壽命會明顯縮短。

Image is out of focus (focus setting differs from WD). Use the coarse/fine focus sliders or Auto focus.影像失焦（焦距設定與工作距離不一致），請調整焦距粗調／細調或按自動對焦。

Astigmatism present: features streak in one direction when slightly under- or over-focused. Adjust stigmator X/Y.存在散光：輕微欠焦或過焦時，影像沿單一方向拉長，請調整 X/Y 散光。

Charging! A non-conductive specimen without coating is being imaged at this beam energy. Apply a C or Au coating, or lower the beam energy (about 1–1.5 keV).荷電效應！非導體試樣未鍍膜，請加上碳或金鍍膜，或降低電子束能量（約 1–1.5 keV）。

Tip: polished cement-based sections are nearly flat; BSE (atomic-number contrast) reveals phases far better than SE.提示：水泥系拋光切片幾乎平坦，以背散射電子（原子序對比）觀察相組成遠優於二次電子。

Specimen Image試樣影像

Zoom (magnification)放大／縮小 (倍率) Pan (stage)平移 (載台) Working distance工作距離

Drag: move specimen stage · Mouse wheel: magnification · Double-click: center on point · EDS tool: click a point or drag a rectangle拖曳：移動試樣載台 · 滾輪：放大倍率 · 雙擊：置中 · EDS 工具：點選位置或拖曳框選區域

EDS Spectrum: Counts vs. Energy (eV)EDS 光譜：計數 vs. 能量 (eV)

Energy range能量範圍 0 - 5000 eV0 - 10000 eV0 - 20000 eV0 - 30000 eV Log scale對數座標 Show KLM markers of selected element顯示所選元素 KLM 標線

Energy axis zoom能量軸放大／縮小 Pan平移 Counts axis計數軸

Mouse wheel: zoom energy axis at cursor · Shift + wheel: zoom counts axis · Drag: pan · Shift + drag: zoom to selected energy range · Double-click: reset滾輪：以游標為中心縮放能量軸 · Shift + 滾輪：縮放計數軸 · 拖曳：平移 · Shift + 拖曳：框選能量範圍放大 · 雙擊：重設

Enable the EDS detector and press “Acquire spectrum”.請開啟 EDS 偵測並按下「擷取光譜」。

Low X-ray count rate: increase the spot size (probe current) or the live time for better statistics.X 光計數率偏低：請加大電子束點大小（探針電流）或延長量測時間以改善統計。

Dead time above 40 %: reduce the spot size (probe current).死時間超過 40 %：請減小電子束點大小（探針電流）。

Overvoltage U = E₀/E_c < 2 for some K lines: excitation is inefficient. Use E₀ of at least twice the highest edge energy of interest.部分 K 線的過電壓比 U = E₀/E_c < 2，激發效率不佳；E₀ 宜至少為欲分析元素最高吸收邊能量的兩倍。

Standardless quantification assumes a flat, polished, untilted specimen; tilt and rough surfaces bias the absorption correction.無標準品定量假設試樣平坦、拋光且未傾斜；傾斜或粗糙表面會使吸收修正產生偏差。

Point analysis: the X-ray generation volume (dashed circle on the image) can be larger than the feature, so neighbouring phases contribute to the spectrum.點分析：X 光產生體積（影像上虛線圓）可能大於目標顆粒，因此周圍相也會貢獻訊號。

EDS Quantification: Element ProportionsEDS 定量：各元素比例

Show true composition of the analysed volume (instructor mode)顯示分析體積的真實成分（教師模式）

Element元素	Line譜線	Net counts淨計數	wt%	±2σ (wt%)	at%	wt% (true)(真實)	wt%

Standardless quantification by peak fitting with a simplified ZAF (atomic number, absorption) model, normalised to 100 wt%. Hydrogen cannot be detected by EDS. ND = not detected (net peak < 3σ).以峰擬合搭配簡化 ZAF（原子序、吸收）修正之無標準品定量，並正規化至 100 wt%。EDS 無法偵測氫。ND 表示未偵測到（淨峰值 < 3σ）。

Characteristic X-ray Energies between Atomic Orbitals各元素原子軌域間的特性 X 光能量

Filter篩選 Unit單位 eVkeV Only elements in current specimen只顯示目前試樣中的元素

Z	Element元素	Kα1 K–L3	Kα2 K–L2	Kβ1 K–M3	Lα1 L3–M5	Lβ1 L2–M4	Mα1 M5–N7	K edgeK 吸收邊	L3 edgeL3 吸收邊

Siegbahn notation with IUPAC transition (final–initial vacancy level) below. Click a row to draw its energy-level diagram and mark its lines on the spectrum. Rows highlighted in green contain elements of the current specimen. Data: X-ray Data Booklet (LBNL); J.A. Bearden, Rev. Mod. Phys. 39 (1967).上方為 Siegbahn 符號，下方為 IUPAC 躍遷標記（電子空位層級）。點選任一列可繪製其能階圖並於光譜上標示譜線；綠色標示為目前試樣所含元素。資料來源：X-ray Data Booklet (LBNL)；J.A. Bearden, Rev. Mod. Phys. 39 (1967)。

SEM Main Components掃描式電子顯微鏡主要部件

Electron Sources電子源比較

Source電子源	W	LaB6	FEG
Emission發射機制	Thermionic熱游離	Thermionic熱游離	Schottky field蕭特基場發射
Brightness亮度 (A/cm2sr)	~106	~107	~5×108
Source size電子源尺寸	30–100 µm	5–50 µm	15–30 nm
Energy spread能量散佈 (eV)	1.5–2.5	1.0–1.5	0.3–0.7
Lifetime壽命 (h)	40–100	500–1000	>5000
Gun vacuum槍室真空度 (Pa)	10−3	10−5	10−7

© AEML, NTUST · Advanced Engineering Materials Laboratory, National Taiwan University of Science and Technology · SEM Virtual Lab. Educational simulation: models are simplified.先進工程材料實驗室 · 國立臺灣科技大學 · SEM 虛擬實驗室。本模擬為教學用簡化模型。